Atomic Layer Deposition. Principles, Characteristics, and Nanotechnology Applications. David Cameron

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Название: Atomic Layer Deposition. Principles, Characteristics, and Nanotechnology Applications

Автор: David Cameron

Издательство: John Wiley & Sons Limited

Жанр: Зарубежная образовательная литература

Серия:

isbn: 9781118747421

isbn: 0

Аннотация:

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.